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List of publications of Stolarek, David (6)

2016 | Conference contribution | published
Partially slotted silicon ring resonator covered with electro-optical polymer
Patrick Steglich, Christian Mai, David Stolarek, Stefan Lischke, Sebastian Kupijai, Claus Villringer, Silvio Pulwer, Friedhelm Heinrich, Joachim Max Bauer, Stefan Meister, Dieter Knoll, Mauro Casalboni, Sigurd K. Schrader (2016)
Proceedings of SPIE : Silicon Photonics and Photonic Integrated Circuits V (pp. k.A.).
THpub | DOI
2015 | Journal article | open access
Novel Ring Resonator Combining Strong Field Confinement with High Optical Quality Factor
Patrick Steglich, Christian Mai, David Stolarek, Stefan Lischke, Sebastian Kupijai, Claus Villringer, Silvio Pulwer, Friedhelm Heinrich, Joachim Max Bauer, Stefan Meister, Dieter Knoll, Mauro Casalboni, Sigurd K. Schrader (2015)
IEEE Photonics Technology Letters. 20 (27), 2197-2200.
THpub | DOI | URL
2011 | Conference contribution | published
Micro-cavities based on width modulated SOI waveguides
Stefan Meister, Aws Al-Saadi, Bülent A. Franke, Shaimaa Mahdi, Miroslaw Szczambura, Berndt Kuhlow, Ulrike Woggon, Lars Zimmermann, Harald H. Richter, David Stolarek, Sigurd K. Schrader, Hans Joachim Eichler (2011)
Proceedings of SPIE : Silicon Photonics VI (pp. 79430T).
THpub | DOI
2011 | Conference contribution | published
Spontaneous and stimulated Raman scattering in planar silicon waveguides
Sha Wang, Stefan Meister, Shaimaa Mahdi, Bülent A. Franke, Aws Al-Saadi, Lars Zimmermann, Harald H. Richter, David Stolarek, Viktor Lisinetskii, Viachaslau Ksianzou, Sigurd K. Schrader, Hans Joachim Eichler (2011)
Proceedings of SPIE : Silicon Photonics VI (pp. 794315).
THpub | DOI
2008 | Conference contribution | published
100 nm half-pitch double exposure KrF lithography using binary masks
Sebastian Geisler, Joachim Max Bauer, Ulrich Haak, David Stolarek, K. Schulz, H. Wolf, W. Meier, M. Trojahn, E. Matthus (2008)
Proceedings of SPIE : Optical Microlithography XXI (pp. 69241Z).
THpub | DOI
2008 | Conference contribution | published
Double exposure technology for KrF lithography
Sebastian Geisler, Joachim Max Bauer, Ulrich Haak, David Stolarek, K. Schulz, H. Wolf, W. Meier, M. Trojahn, E. Matthus, Harald J. Beyer, G. Old, S. Marschmeyer, B. Kuck (2008)
Proceedings of SPIE : 24th European Mask and Lithography Conference (pp. 679203).
THpub | DOI