100 nm half-pitch double exposure KrF lithography using binary masks
Title:
100 nm half-pitch double exposure KrF lithography using binary masks
Authors:
Sebastian Geisler ; Joachim Max Bauer TH ; Ulrich Haak ; David Stolarek ; K. Schulz ; H. Wolf ; W. Meier ; M. Trojahn ; E. Matthus
Year:
2008
Publication type:
Conference contribution
Conference:
SPIE Advanced Lithography
Book title:
Proceedings of SPIE : Optical Microlithography XXI
ISSN:
0277-786X
Pages:
69241Z
Language:
English
Document status:
Published
PubListerURL:
https://publister.bib.th-wildau.de/publister/public/publication/1565
Keywords:
Lithography; Scanners; Refraction; Antireflective coatings; Chemicals; Fabrication; Lenses
Geisler, S., Bauer, J., Haak, U., Stolarek, D., Schulz, K., Wolf, H., et al. (2008). 100 nm half-pitch double exposure KrF lithography using binary masks Proceedings of SPIE : Optical Microlithography XXI (pp. 69241Z). .
@inproceedings{1565,
author = {Geisler, Sebastian and Bauer, Joachim Max and Haak, Ulrich and Stolarek, David and Schulz, K. and Wolf, H. and Meier, W. and Trojahn, M. and Matthus, E.},
title = {100 nm half-pitch double exposure KrF lithography using binary masks},
year = {2008},
pages = {69241Z},
booktitle = {Proceedings of SPIE : Optical Microlithography XXI},
doi = {10.1117/12.771333},
}